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The purpose of this project is to gain fundamental understanding of extreme ultraviolet radiation chemistry thereby accelerating the development of novel photoresist materials crucial to maintaining the long term viability of the semiconductor industry. Using a variety of tools including photoelectron imaging of nanoparticle beams (http://pubs.acs.org/doi/abs/10.1021/nl070834g), synchrotron based molecular beam mass spectrometry (http://www.jove.com/video/50164/molecular-beam-mass-spectrometry-with-tunable-vacuum-ultraviolet-vuv), electronic structure calculations, vibrational and surface analytical techniques, as well as novel methods of preparing photoresist materials, a new paradigm will be established at Lawrence Berkeley National Laboratory. Here you will work with a team which comprise the chemical dynamics beamline at the Advanced Light Source (http://www.chemicaldynamics.lbl.gov/), the Center for X-ray Optics (http://www.cxro.lbl.gov/) and the molecular foundry (http://foundry.lbl.gov/).

Qualified candidates will hold a PhD in Chemistry, Physics, or a related field and will ideally have a strong experimental and instrumental background. Experience with developing and implementing experimental mass spectrometry techniques and/or photoelectron spectroscopy is required as is the ability to build and adapt instrumentation (optics, lasers, electronics, and vacuum systems). A knowledge of electronic structure calculation methods is desirable. Demonstrated ability to work in teams would be a very big +.

Interested applicants should submit materials to Musahid Ahmed via email: mahmed@lbl.gov

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