Investigations of scanning probe techniques for characterization of 3D nanostructures (Braunschweig)

Scanning probe microscopy plays an important role in different fields of nanotechnology. The main objectives of this open position are a) to develop and compare new 3D sensitive probes and probing techniques in addition to the conventional raster scan methods and b) to develop simulations for description of the measurement signals in dependence of the relevant interaction forces between probing tip and 3D nanostructures.

These investigations target at an in-depth understanding and optimization of scanning probe microscopy to be used for high precision characterization of 3D nanostructures. 3D nanostructures on masks and wafers e.g. are the functional components in production and use of semiconductor devices. In this area, the continuous shrinkage of device structure size requires the development and application of more precise microscopic measurement methods (SEM, SPM, 193 nm microscopy) which are used in parallel to integral measurement methods, like e.g. scatterometry (DUV, EUV).

In addition to the announced SPM investigations, the other microscopic and integral methods for characterization of 3D nanostructures are current research topics, which are dealt with in close cooperation of manufacturers and users of high precision measurement instrumentation.

Please note that application is only possible online at Deadline is 31 March 2011.

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Tags: TINC-Job, monitor


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Publications by A. Paszternák:

Smartphone-Based Extension of the Curcumin/Cellophane pH Sensing Method

Pd/Ni Synergestic Activity for Hydrogen Oxidation Reaction in Alkaline Conditions

The potential use of cellophane test strips for the quick determination of food colours

pH and CO2 Sensing by Curcumin-Coloured Cellophane Test Strip

Polymeric Honeycombs Decorated by Nickel Nanoparticles

Directed Deposition of Nickel Nanoparticles Using Self-Assembled Organic Template,

Organometallic deposition of ultrasmooth nanoscale Ni film,

Zigzag-shaped nickel nanowires via organometallic template-free route

Surface analytical characterization of passive iron surface modified by alkyl-phosphonic acid layers

Atomic Force Microscopy Studies of Alkyl-Phosphonate SAMs on Mica

Amorphous iron formation due to low energy heavy ion implantation in evaporated 57Fe thin films

Surface modification of passive iron by alkylphosphonic acid layers

Formation and structure of alkylphosphonic acid layers on passive iron

Structure of the nonionic surfactant triethoxy monooctylether C8E3 adsorbed at the free water surface, as seen from surface tension measurements and Monte Carlo simulations

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