These investigations target at an in-depth understanding and optimization of scanning probe microscopy to be used for high precision characterization of 3D nanostructures. 3D nanostructures on masks and wafers e.g. are the functional components in production and use of semiconductor devices. In this area, the continuous shrinkage of device structure size requires the development and application of more precise microscopic measurement methods (SEM, SPM, 193 nm microscopy) which are used in parallel to integral measurement methods, like e.g. scatterometry (DUV, EUV).
In addition to the announced SPM investigations, the other microscopic and integral methods for characterization of 3D nanostructures are current research topics, which are dealt with in close cooperation of manufacturers and users of high precision measurement instrumentation.
Please note that application is only possible online at www.igsm.tu-bs.de. Deadline is 31 March 2011.
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