EPIC Quadrupole mass spectrometers for UHV analysis of neutrals, radicals and ions

EPIC Quadrupole mass spectrometers for UHV analysis of neutrals, radicals and ions

Triple Filter Quadrupoles for Precision Gas Analysis and Scientific Applications.

- Neutrals, Radicals, Positive & Negative ions.
- Electron Attachment Studies.
- Surface Science, Molecular Beam Studies.
- UHV Temperature Programmed Desorption.
- High Performance RGA.
- Desorption / Outgassing studies / Bakeout cycles.
- Chamber / Process gas Contaminants

Hiden EPIC mass spectrometers for high precision scientific, process applications and UHV analysis of neutrals, radicals, and ions, featuring:

- High Sensitivity, Enhanced detection from 100% to 5ppb.
- Mass range options to 2500 amu, 6,9 or 12 mm pole diameter options.
- Enhanced long-term Stability (less than ±0.5% height variation over 24 h).
- Ion Energy distribution by mid-axis potential scanning ±100 V, 1000 eV Option.
- Ion source control for soft ionisation and appearance potential mass spectrometry.
- Enhanced sensitivity for high mass transmission, Automatic mass scale alignment.
- Pulse Ion Counter for continuous 7 decade dynamic range, Faraday option to 5x1010
- Enhanced contamination resistance via the RF-only pre-filter stage.
- Signal gating 1µs resolution for energy & mass distributions vs time or TOF studies.
- Temperature reading integrated into data displays for thermal desorption applications.
- Integral UHV compatible shroud, Liquid Nitrogen cooled shroud option.
- MASsoft control via RS232, RS485 or Ethernet LAN.
- Upgradeable to Plasma / SIMS specification.

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Publications by A. Paszternák:

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pH and CO2 Sensing by Curcumin-Coloured Cellophane Test Strip

Polymeric Honeycombs Decorated by Nickel Nanoparticles

Directed Deposition of Nickel Nanoparticles Using Self-Assembled Organic Template,

Organometallic deposition of ultrasmooth nanoscale Ni film,

Zigzag-shaped nickel nanowires via organometallic template-free route

Surface analytical characterization of passive iron surface modified by alkyl-phosphonic acid layers

Atomic Force Microscopy Studies of Alkyl-Phosphonate SAMs on Mica

Amorphous iron formation due to low energy heavy ion implantation in evaporated 57Fe thin films

Surface modification of passive iron by alkylphosphonic acid layers

Formation and structure of alkylphosphonic acid layers on passive iron

Structure of the nonionic surfactant triethoxy monooctylether C8E3 adsorbed at the free water surface, as seen from surface tension measurements and Monte Carlo simulations

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