Industrial Applications for The Hiden EQP System - Mass and Energy Analyser for Plasma Diagnostics

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Complete energy resolved mass speciation and mass resolved energy analysis of all species in your plasmaApplications:- Positive ions, Negative Ions, Neutral Radicals and Neutrals analysis.- Etching / Deposition Studies- Ion implantation / Laser Ablation- Residual Gas Analysis / Leak Detection- Plasma electrode coupling - follow electrode conditions during operation.- Analysis through a viewport, grounded electrode, driven electrodeThe Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes, featuring:- Software controlled Ion Extraction Optics for minimum plasma perturbation.- 45° Electrostatic Sector analyser, Scan Energy at 0.05 eV increments/ 0.25eV FWHM.- Minimum perturbation of ion flight path & constant ion transmission at all energies.- Differentially pumped Triple filter Quadrupole, mass range options to 2500amu.- High Sensitivity / Stability Pulse Ion Counting Detector with 7 decade dynamic range.- Tuneable integral ioniser for appearance potential MS with electron attachment option.- Penning Gauge and interlocks to provide over pressure protection.- Signal gating and programmable signal gating option for time resolved studies in pulsed plasma.- 1000eV Option, Floating option up to 10keV, Faraday Cup for high density plasmas.- Mu-Metal, Radio-metal shielding options, high pressure operation option.MASsoft control via RS232, RS485 or Ethernet LAN.Presented by Mark Buckley. With thanks to AZoM.com who filmed the video.

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