Gender
Male
Location
Mumbai
Birthday:
September 14
I am...
Physicist
My research field or area of interest innanotechnology
semiconductor thin films and nanotechnology, Electronic and optoelectronic Devices, solar cell, Energy storage devices
Interest in...
Semiconductor thin films and nanotechnology, Electronic and optoelectronic Devices, solar cell, Energy storage devices
Publication list
1. N. Meshram, C. Loka, K. R. Park, S. E. Lee, K. S. Lee, S. W. Moon, ‘Fabrication of ITO/SiO 2/ITO on sapphire substrate for self-capacitance type touch screen display’,(Accepted in Journal Science of Advanced Materials 2016) 2. N. Meshram, C. Loka, K. R. Park, K.S. Lee, ‘Enhanced transmittance of ITO/Ag(Cr)/ITO (IAI) multi-layered thin films by high temperature annealing’, Materials Letters, 145 (2015)120– 124. 3. Ankur Soam, N. Meshram, Alka Kumbhar and R. O. Dusane, ‘Silicon Nanowires for electrochemical capacitor’, NC2E-2014 Proceeding, ISBN 978-93-83991-10-9. 4. Ankur Soam, N. Meshram, Alka Kumbhar and R.O. Dusane, ‘Growth of high density Silicon nanowires using Sn as a catalyst’, ICEMP 2014 proceedings. 5.N. Meshram, A. Kumbhar and R.O. Dusane, ‘Synthesis of silicon nanowires using tin catalyst by hot wire chemical vapor processing’, Materials Research Bulletin, 48 (2013) 2254–2258. 6.N. Meshram, A.Kumhar and R. O. Dusane, ‘Silicon nanowire growth on glass substrates using hot wire chemical vapor deposition’, Thin Solid Films, 519 (2011) 4609-4612. 7.N. Meshram, A. Kumbhar and R.O. Dusane, ‘Formation of metallic nanoparticles from metal oxide film by hot wire generated atomic hydrogen’ Conference proceeding (NANO-2010) “ Macmillan Publisher India Ltd. pp-27, ISBN No. 023-033-193-9. 8.P. Chaudhari, N. Meshram, A. Singh, A. Topkar, R. O. Dusane, ‘Hot wire chemical vapour deposition (HWCVD) of boron carbide thin films from ortho-carborane for neutron detection application’, Thin Solid Films, 519 (2011) 4561–4564. 9. T. Muneshwar, V. Verma, N. Meshram, S. Soni, R.O. Dusane, ‘Development of low temperature RF- magnetron sputtered ITO film on flexible substrates’, Sol. Energy Mater. Sol. Cell, 94 (2010) 1448-1450. 10. N. Wadibhasme, S. Soni, A.Kumbhar, N. Meshram, R.O. Dusane, ‘Designing single chamber HWCVD system for high deposition rate device quality a-Si:H thin film and solar cell’, J. Nano-Electron. Phys. 3 (2011) 943-947.
Researchgroup, Institute, University, School, Company name
Indian Institute of Technology Bombay
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