Scientist Semiconductor Process Technology (Berlin)

The Ferdinand-Braun Institut (FBH), Leibniz-Institut für Höchstfrequenztechnik, is part of the Forschungsverbund Berlin e.V. and member of the Leibniz Association. FBH is co-financed by the State of Berlin and the German Federal Government. It is one of the world-wide leading institutes for applied research on high-power diode lasers and microwave components & systems. Based on III-V semiconductors, its research activities range from design & simulation, semiconductor processing, mounting & packaging, to ready-to-ship modules. In close cooperation with its partners in research and industry, FBH transfers its results into applications in communications, laser and space technology.  For more details see:

We started a new project on fabrication and assembly of integrated circuits (MMICs) for frequencies above 100 GHz, for sensor applications and radar with high spatial resolution. The devices are based on InP-HBTs fabricated in FBH’s transferred substrate (TS) technology. Novel techniques have to be developed for integration of such THz-MMICs into multi-chip modules with optimized heatsinking and low interconnet losses.
To expand our newly established team for InP-based THz electronics we are currently seeking a Scientist Semiconductor Process Technology
Reference No. 11/11

You should have a profound record of experimental work on microwave components and excellent expertise in semiconductor device processing, preferably of InP or HBTs. You will be responsible for TS-MMIC process design, control, supervision and evaluation.

FBH is an equal opportunity employer. Female candidates are encouraged to apply. Among equally qualified applicants preference will be given to handicapped candidates. We actively assist foreign colleagues with their integration.

Please submit your application by September 24th, 2011 indicating the corresponding reference number.

Ferdinand-Braun-Institut für Höchstfrequenztechnik
c/o Mrs. C. Fischer
Gustav-Kirchhoff-Straße 4
D-12489 Berlin

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Publications by A. Paszternák:

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Surface analytical characterization of passive iron surface modified by alkyl-phosphonic acid layers

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Amorphous iron formation due to low energy heavy ion implantation in evaporated 57Fe thin films

Surface modification of passive iron by alkylphosphonic acid layers

Formation and structure of alkylphosphonic acid layers on passive iron

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