"Hot Nanotechnology Papers 2011": Growth of silicon nanowires by electron beam evaporation using indium catalyst

Title of the paper: Growth of silicon nanowires by electron beam evaporation using indium catalyst

Authors: R. Rakesh Kumar , K. Narasimha Rao, A.R. Phani

University/Institute: Department of Instrumentation and Applied Physics, Indian Institute of Science, Bangalore 560012, India

Abstracts:For the first time silicon nanowires have been grown on indium (In) coated Si (100) substrates using e-beam evaporation at a low substrate temperature of 300 °C. Standard spectroscopic and microscopic techniques have been employed for the structural, morphological and compositional properties of as grown Si nanowires. The as grown Si nanowires have randomly oriented with an average length of 600 nm for a deposition time of 15 min. As grown Si nanowires have shown indium nanoparticle (capped) on top of it confirming the Vapor Liquid Solid (VLS) growth mechanism. Transmission Electron Microscope (TEM) measurements have revealed pure and single crystalline nature of Si nanowires. The obtained results have indicated good progress towards finding alternative catalyst to gold for the synthesis of Si nanowires.

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