CHM Postdoctoral Research Associate Position at NIST CNST

Applicants are invited for a Postdoctoral Research Associate position in Nanomanufacturing Measurement and Process Control of Diblock Copolymers.


The objectives of the research are to develop models to simulate the electromagnetic response of diblock materials as a function of domain size and morphology in both the near- and far-field regimes and to apply those models to the development of non-contact, high-speed, optical measurement methods for nanostructure characterization in roll-to-roll manufacturing.


The project is part of a collaboration between the Center for Hierarchical Manufacturing (CHM) at the University of Massachusetts Amherst and the Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) in Gaithersburg, MD.  The successful applicant will be employed by UMass while the research will take place primarily at CNST, but it is anticipated that frequent travel between UMass and NIST will be needed to facilitate the collaboration.


The successful applicant will have a Ph.D. degree (or have submitted his/her doctoral thesis) in Physics, Electrical Engineering, Materials Science, or related fields and have a good track record of research in the interaction of light with nanostructures.  A good publication record, experience working in multidisciplinary teams, demonstrated ability for scientific accomplishment with minimal direct guidance, and ability to travel between UMass and NIST are required.  Salary will be approximately $60k/year.


Interested candidates should submit a CV, a list of publications, and the names and addresses of three professional references to either (preferred) or MassNanoTech, c/o Dr. Paul J. Clark, 374 Lederle Graduate Research Tower, University of Massachusetts, 710 N. Pleasant Street, Amherst MA 01003.  Please reference Search #36869.


The priority application deadline is July 15, 2011.  However, applications will be accepted beyond that date until the position is filled.



The University of Massachusetts is an Affirmative Action/Equal Opportunity Employer.  Women and members of minority groups are encouraged to apply.

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Publications by A. Paszternák:

Smartphone-Based Extension of the Curcumin/Cellophane pH Sensing Method

Pd/Ni Synergestic Activity for Hydrogen Oxidation Reaction in Alkaline Conditions

The potential use of cellophane test strips for the quick determination of food colours

pH and CO2 Sensing by Curcumin-Coloured Cellophane Test Strip

Polymeric Honeycombs Decorated by Nickel Nanoparticles

Directed Deposition of Nickel Nanoparticles Using Self-Assembled Organic Template,

Organometallic deposition of ultrasmooth nanoscale Ni film,

Zigzag-shaped nickel nanowires via organometallic template-free route

Surface analytical characterization of passive iron surface modified by alkyl-phosphonic acid layers

Atomic Force Microscopy Studies of Alkyl-Phosphonate SAMs on Mica

Amorphous iron formation due to low energy heavy ion implantation in evaporated 57Fe thin films

Surface modification of passive iron by alkylphosphonic acid layers

Formation and structure of alkylphosphonic acid layers on passive iron

Structure of the nonionic surfactant triethoxy monooctylether C8E3 adsorbed at the free water surface, as seen from surface tension measurements and Monte Carlo simulations

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