The PhD candidates will assist the “EUV Plasma Dynamics” team at ARCNL in the construction of a laser-produced plasma source based on Tin such as used in EUV lithographic processes. Spectroscopic properties of the plasma will be investigated in the EUV, VUV and optical range as well as mass spectrometry for characterization of the Tin charge states produced. The dynamics of the droplet plasma, including its modeling, as well as the production of debris fast ions, molecules, clusters and nano-particles will be investigated.

Description

• You have an MSc-degree in Physics, Physical Chemistry, Engineering or Materials Science; • Knowledge of lasers, spectroscopy and quantum mechanics, as well as skills of vacuum technology would be advantageous; • Good communication skills (in English) are required.

Application procedure information

For further information please contact the EUV Plasma Diagnostics staff
 
Prof.dr. W. (Wim) Ubachs
e-mail: w.m.g.ubachs@vu.nl
phone: +31 (0)20-5987948
or
Prof.dr.ir.  R. (Ronnie) Hoekstra
e-mail: r.a.hoekstra@rug.nl
phone: +31 (0)50-363368
 
Applicants are invited to send a resume and motivation on why you want to join the group (max. 1 page) mentioning the vacancy number in the email header or upper left corner of both letter and envelope, before August 28, 2014 to:
 
FOM Institute AMOLF
P&O dept.
Postbus 41883
1009 DB  Amsterdam, The Netherlands

Preferably by e-maill: application@arcnl.nl mentioning [vacancy nr.: 14250] in the subject line.
 
Applications without this motivation will not be taken into account. However, with this motivation your application will receive our full attention. Online screening may be part of the selection.