Main features:
Three 3” magnetron high magnetic field sources
RF and DC pulsed power supply
Cryo pumped with base pressure in 10E-8 torr range
3 gases with MFC
Reactive co-sputtering
250C substrate heater, 4”
Z-movement of substrate during deposition with adjustable high and low setpoints for uniformity and layer improved structure
Please let me know if it looks good for publishing and if anyone is interested for more details
Best regards,
Angel Hershko
Vacuum Systems Technologies & Services Ltd.
Vice President
www.vacuumltd.com
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