Nanotech Journal Club: Optical emission spectroscopy of Aluminum Nitride thin films deposited by Pulsed Laser Deposition

Paper shared by Jaime Andrés Pérez Taborda

Optical emission spectroscopy of Aluminum Nitride thin films deposited by Pulsed Laser Deposition

JA Pérez, LP Vera, H Riascos, JC Caicedo

Abstract. In this work we study the Aluminium Nitride plasma produced by Nd: YAG pulsed laser,(λ= 1064 nm, 500 mJ, τ= 9 ns) with repletion rate of 10 Hz. The laser interaction on Al target (99.99%) under nitrogen gas atmosphere generate a plasma which is produced at room temperature; with variation in the pressure work from 0.53 Pa to 0.66 Pa matching with a applied laser fluence of 7 J/cm2. The films thickness measured by profilometer was 150 nm.  

http://iopscience.iop.org/1742-6596/511/1/012078

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