My research field or area of interest innanotechnology
Myself Sumit Barthwal post-graduated (chemistry) from Kanpur university, India. Presently I am working in DST Unit of Nanosciences Center at Indian Institute of Technology (IIT) Kanpur (India), Under Prof. Ashutosh Sharma. I am working here from past 5 years and have experience of handling and operating different instruments(like AFM/STM, XRD, SAXs , maskless lithography and SEM). I am also involved in different projects going on here. Now I want to pursue the Doctorate program that will widen my horizons and help me acquire the versatility required to achieve my full potential.
C/O:Prof. Ashutosh. Sharma
Department of Chemical Engg.
Indian Institute of Technology Kanpur,
KANPUR 208016, INDIA
Current Research Work:
Presently, I am involved in the following research works under the supervision of Prof. Ashutosh Sharma, at the DST Unit on Nano science, IIT- Kanpur, India
• Fabrication of low cost polymer based cantilever arrays using maskless lithography technique.
We propose a novel and simplified method to make low cost disposable polymer cantilever arrays in SU-8 for bio-chemical sensing using grayscale lithography in concert with a maskless exposure system. Cantilever arrays of different dimensions were fabricated reproducibly and the process parameters characterized. Arrays of suspended cantilevers can be used for the fabrication of chemical/biochemical sensors as SU-8 is highly resistant to chemicals and biocompatible making it a suitable material for such sensors. Furthermore, due to its low Young’s modulus, high sensitivity can be achieved.
• Surface Plasmon Based 2D Colloidal Crystal Flexible Sensors for Chemisorptions Application.
In the present work, 2-D colliodol crystal array (using Nanosphere lithography technique) , having nanostructure on their surface and partial embedded in a flexible elastomor substrate (PDMS) are proposed to explore as an active potential candidate for the building block of flexible sensors application.
• Fabrication of Large Area Periodic Nanostructures Using Nanosphere lithography (NSL)
Nanosphere lithography is an inexpensive method that can produce large area, size-tunable patterns with high throughput and low cost. Currently working on fabricating nano & micro level different structures (like holes and pillars) on polymer films by self-assembled monolayer of polystyrene (PS) nanospheres using nanosphere lithography (NSL), which can further be used as molds for Nano-Imprint Lithography (NIL) and in other applications .
• Synthesis and characterization of nanostructures (nanowires, nanorods, nanobelts) for various applications.
Realization of vertically well aligned 1D ZnO nanostructures has been considered for application to nano-scale light-emitting diodes (LEDs), nanosensors, and field emitters. 1D nanowires were grown by the template based electrochemical technique. Electrodeposition was performed potentiostatically (Auto Lab) at room temperature. The structural and chemical analysis of grown 1D nanostructure were performed by XRD, Raman, TEM and FESEM etc.
Surface topography and morphology characterization of PIII irradiated silicon surface,
Satinder K. Sharma and Sumit Barthwal, Applied Surface Science, 17552 (1-6), (2008)
Researchgroup, Institute, University, School, Company name
DST unit of Nanoscience, Department of Chemical Engineering, Indian Institute of Technology (IIT), Kanpur-208016 (U.P.)- India
Researchgroup, Institute, Company, University, School webpage
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