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INS Finland's Blog

10nm pattern generation using thermal scanning probe lithography enabled by simplified materials and processes

Posted on February 27, 2018 at 10:53am 0 Comments

Thermal scanning probe lithography (tSPL) has been used to create patterns with sub-20 nm half pitch resolution. Pattern generation uses a thermally sensitive resist and spin coatable hard mask materials to transfer the resist patterns. Spin coatable materials permit users of tSPL to reduce time and cost of the patterning process.…

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