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NANOPARTICLES SEPARATION FROM SOLUTION

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vinoth kumar.N left a comment for Dr T.Maiyalagan
"0.6(mole%) of La doped Tio2 means (LANTHANU NITRATE AND TITANIUM TETRA ISOPRPOXIDE AS PRECURSORS) How much amount of precursors i need to take and 0.6 denotes La or the La No3?.Anyone knows mean clarify to me pls"
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Dr T.Maiyalagan is now friends with Govind Mundada, Kaliappan Muthukumar and Abu Bakr Ahmed Amine Nassr
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Chandana Avasarala left a comment for Dr T.Maiyalagan
"hello sir! glad to meet you in nanopaprika! can you tell me how to do internships at european countries? I am doing my Engineering 3rd yr in India with Metallrgy and Materials Technology as my branch of study.Please advice me to do best."
May 16, 2009
Dr T.Maiyalagan is now friends with sudhir kumar sinha and Chandana Avasarala
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At 5:29pm on September 23, 2010, vinoth kumar.N said…
0.6(mole%) of La doped Tio2 means (LANTHANU NITRATE AND TITANIUM TETRA ISOPRPOXIDE AS PRECURSORS) How much amount of precursors i need to take and 0.6 denotes La or the La No3?.Anyone knows mean clarify to me pls
At 11:10am on May 16, 2009, Chandana Avasarala said…
hello sir! glad to meet you in nanopaprika! can you tell me how to do internships at european countries? I am doing my Engineering 3rd yr in India with Metallrgy and Materials Technology as my branch of study.Please advice me to do best.
At 8:46pm on January 28, 2009, TINC said…

Welcome to the nanoscience community!

Invite your friends, write your blog, discusse in our forum, chat... add your nanoevents...

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At 6:48am on January 24, 2009, GEORGE VARUGHESE said…

At 6:36am on January 24, 2009, GEORGE VARUGHESE said…

At 5:12am on January 24, 2009, Jose Feneque, DVM said…
Welcome to our community!
At 6:11pm on January 23, 2009, remi said…
To the management and R&D department




FYI: Remotely Generated Plasma Thin Film Deposition/Sputtering

Hello

Our company is a holder of patents and know how relating to a remote generated plasma thin film deposition/sputtering technology demonstrating much improved coating speeds and characteristics compared to the current industrial standard, magnetron technology. Our technology can lay down materials that magnetron is not capable of or has great difficult in doing so. We can also adapt our technology to most existing magnetron systems. As part of our strategic development, we are seeking to establish mutually beneficial partnerships with actors in this industry.

If this is of interest to you, we would welcome the opportunity to discuss this with you. For your information, please visit our site at www.plasma-quest.com where you will be able to judge the merits of our technology and its benefits,. I also invite you to download our 28 page HiTUS technology information document, which explains our technology in detail - www.plasma-quest.com/hitusintroduction.pdf - .

We look forward to hearing from you and thank you in advance for your attention to this email.

Kind regards

Rémi Mollicone

remi@plasma-quest.com
www.plasma-quest.com
Plasma Quest Ltd – International Business Development.