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Dr.D.NIRMAL and Gopalakrishnan.M are now friends
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Dr.D.NIRMAL is now a member of The International NanoScience Community
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Profile Information

I am...
Engineer, Nanotech Journalist
My research field or area of interest innanotechnology
NANOELECTRONICS, VLSI
Interest in...
FABRICATION AND MODELLING
Publication list
 Nirmal .D, Vijayakumar .P, Shruthi and Mohan Kumar .N “Nanoscale Channel Engineered Double Gate MOSFET for Mixed Signal Applications using High-k Dielectric”, International journal of circuit theory and applications. (Wiley)Voiume 41, Issue 6, pp 608-618,2013. ( Impact Factor: 1.759).
 Nirmal .D, Vijayakumar .P, Patrick Chella Samuel , Binola k Jebalin, and Mohan Kumar .N “Subthreshold analysis of nanoscale FinFETs for ultra low power application using high-k materials”, International Journal of Electronics.(Taylor and Francis) Volume 100, Issue 6,pp 803-817,2013. (Impact factor: 0.440).
 Nirmal .D, Vijayakumar .P, Divya .D , Binola k Jebalin, and Mohan Kumar .N “Subthreshold Performance of Gate Engineered FinFET Devices and circuit with High-k Dielectrics”, Microelectronics Reliability(Elsevier) 53 (2013) 499–504. (Impact factor: 1.167).
 Nirmal. D , Nalini .B and Cyril Robinson Azariah “ Fabrication and Characteristics of Flexible Thin Film Depletion Mode Field Effect Transistor (FET) using High-κ Dielectric Nano Zirconia” International Journal of Emerging Trends in Engineering and Development, Issue 3, Vol.2 pp.295-299. (March 2013).
 Nirmal .D and Vijayakumar .P “Fin Field Effect Transistors Performance in Analog and RF for High-k Dielectrics” Defence Science Journal, Vol. 61, No. 3, pp. 235-240, May 2011. (Impact factor:0.304)
 Nirmal .D, Shruti .K, Divya Mary Thomas, Patrick Chella Samuel, Vijayakumar .P and Mohan Kumar .N “Impact of Channel Engineering on FINFETs using High-k dielectrics” International Journal of Micro and Nano Electronics, Circuits and Systems, 3(1), pp. 7-11, 2011.
 Nirmal .D, Nalini .B and Vijayakumar .P “Nano sized High K Dielectric Material for FINFET”, Integrated Ferroelectrics(Taylor and Francis), Volume 121, Issue 1, pp. 31 – 35, 2010.(Impact Factor: 0.264)
 Nirmal .D, Vijayakumar .P and Sam Jebaraj “NAND Gate Using FINFET for Nanoscale technology”, International Journal of Engineering Science and Technology Vol.2 (5), pp. 1351-1358, 2010.
 Nirmal .D and Vijayakumar .P “Gate Engineering on the Analog Performance of DM-DG MOSFETs with High K Dielectrics”, International Journal of Advanced Science and Technology Vol. 25, pp. 1-6, December, 2010.
Researchgroup, Institute, University, School, Company name
KARUNYA UNIVERSITY
Researchgroup, Institute, Company, University, School webpage
http://www.karunya.edu/
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Welcome! Nanopaprika was cooked up by Hungarian chemistry PhD student in 2007. The main idea was to create something more personal than the other nano networks already on the Internet. Community is open to everyone from post-doctorial researchers and professors to students everywhere.

There is only one important assumption: you have to be interested in nano!

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Publications by A. Paszternák:

Directed Deposition of Nickel Nanoparticles Using Self-Assembled Organic Template,

Polymeric Honeycombs Decorated by Nickel Nanoparticles, Science of Advanced Materials (Accepted, 05/2014)

Organometallic deposition of ultrasmooth nanoscale Ni film,

Zigzag-shaped nickel nanowires via organometallic template-free route

Surface analytical characterization of passive iron surface modified by alkyl-phosphonic acid layers

Atomic Force Microscopy Studies of Alkyl-Phosphonate SAMs on Mica

Amorphous iron formation due to low energy heavy ion implantation in evaporated 57Fe thin films

Surface modification of passive iron by alkylphosphonic acid layers

Formation and structure of alkylphosphonic acid layers on passive iron

Structure of the nonionic surfactant triethoxy monooctylether C8E3 adsorbed at the free water surface, as seen from surface tension measurements and Monte Carlo simulations

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