The HPR 30 is residual gas analyser configured for analysis of gases and vapours in vacuum processes and for vacuum diagnostics. The system is fully configurable for individual process applications such as CVD, plasma etching, MOCVD, process gas purity and in-process contaminant monitoring.
The HPR 30 system features a close-coupled re-entrant aperture for sampling directly within the process region, providing maximum data integrity and fast confirmation of process status. Options include the innovative Hiden 3F series triple filter quadrupole system providing enhanced abundance sensitivity, part-per-billion (ppb) detection levels and high contamination resistance, particularly suited to the analysis of aggressive gases in CVD and RIE applications.
The HPR 30 sampling system configuration is directly suited to analysis of high mass species and precursors used in ALD and MOCVD applications.
• Custom inlet systems with optimized sampling for metal and metal organic vapors.
• High mass range options available- 500 and 1000 amu.
• High sensitivity RGA for UHV quality chamber base pressure measurements and – leak detection.
• Re entrant sampling orifice for fast response to process gas/vapour gas composition changes.
• Gas/vapour sampling systems optimized for response and sensitivity over a wide pressure range.
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